SEC-2000 Series

SEC-2000 Series

SEC 2000 is the most advanced ashing and etching system in China. Adopting highly advanced plasma stripping technologies and dedicated to processing 100–200 mm wafers by design, the system provides excellent performance at very competitive prices.

Features

• Dual chamber design

• Number of chambers customizable (up to six)

• Separate control of each chamber

• High-density plasma for fast photoresist removal

• Lowest cost of ownership (COO)

• Optional additional plasma technology

       -Remote inductively coupled plasma (ICP)

       -Remote microwave plasma

       -Double plasma (microwave + radio frequency bias)

• Windows-based industrial computer

• EtherCAT-powered Ethernet control automation technology

Applications

• Polymer stripping

• Metal stripping

• Mask material removal

• Photoresist removal after high dose ion implantation

• Photoresist removal for silicon carbide, gallium nitride, gallium arsenide, and indium phosphide production lines

• Wafer surface pretreatment